3 excitation sources (NdYag laser at 532 nm, He-Ne laser at 632.8 nm and laser diode at 785 nm); piezo-electric scanner (100×100 µm); confocal detection with lateral resolution of 200-300 nm; 6 plan achromat objectives; thermoelectrically cooled CCD camera (Peltier cooler, -70°C) for NIR region; UHTS300 spectrometer; detection interval 150 – 3500 cm-1; WITec Project Plus software for multivariate K-means analysis; AFM operation modes: contact mode/lateral force, pulsed force, phase imaging, magnetic force, nanolithography, nanomanipulation; special objective for AFM measurements in liquid media
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Optical inverted microscope (IX 71, Olympus); piezo x-y-scanning table and PiFoc z-piezo actuator for microscope objective; picosecond temporal resolution; excitation: diode lasers (LDH -D series, at 375 nm, 405 nm, 485 nm, 510 nm and 640 nm) for picosecond pulses or cw operation  and femtosecond Ti:Sa laser (Mira 900, Coherent)  tunable from 700 nm to 1000 nm; Single Photon Avalanche Diode (SPAD) detectors; Single Molecule Sensitive Manual Shamrock SR-163 spectrograph equipped with a Newton 970 EMCCD camera from Andor Technology (300 - 1050 nm)
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TI2-E Inverted Microscope (Nikon) with NIS Elements imaging software; two re-scanning units for the Near Infrared wavelength range with spatial resolution of 240 nm (RCM-NIR) and for visible wavelength range with spatial resolution of 170 nm (RCM-VIS), respectively; RCM-NIR unit is equiped with laser diodes at 640 and 785 nm and Hamamtsu Orca Flash 4.0 v3 CCD camera; RCM-VIS unit is equiped with laser diode at 488 nm and PCO EDGE 4.2 CCD camera; epi-fluorescence extension with LED sources and filters: white LED, DAPI - DAPI-50LP filter, FITC - FITC-3540C filter, MCHERRY-40LP filter, LED - LED-Cy5 filter; objectives: CFI Plan Apochromat Lambda 10x, CFI Plan Apochromat Lambda 20x, PA L 40x, CFI Plan Apochromat Lambda 60x Oil, CFI Plan Apochromat Lambda 100x Oil.

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Fluorescence, differential interference contrast (DIC), bright field and dark field visualization; various objectives; light sources: halogen lamp (HAL 100) and metal halide lamp (HXP 120); condensors: Achromatic LD dry and Achromatic-Aplanatic immersion; fluorescence filter sets: set 49 (exc: G 365, em: BP 445/50); set 38 (exc: BP 470/40, em: BP 525/50); set 20 (exc: BP 546/12, em: BP 575-640); set 50 (ex: BP 640/30, em: BP690/50); incubator for biological samples (humidity, temperature and CO2 control).
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Electron beam evaporator EBV 40A1: temperature range 160°C-2300°C; effusion cell EF 40C1: temperature range 250°C-1500°C; 2 axes manipulator: maximum shift 50 mm on Z axis and rotation in XY (maximum speed 60 rpm)
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Size measurement maximum particle size range: 0.3 nm – 5 µm; size measurement minimum sample volume: 20 µL; zeta potential measurement particle size range: 3.8 nm – 100 µm; zeta potential range; no practical limits exist; sample concentration range: up to 40% w/v; minimum sample volume: 750µL (folded capillary cell), 750 µL (dip cell), 150µL (high concentration cell); absolute molecular weight range using Debye plot: 9,800Da – 2×107 Da; molecular weight range: 342 Da – 2×107 Da; autotitrator MPT-2 from Malvern; autotitrator titrant volume: 25 mL; minimum dispense volume: 0.28 µL, 1.68 µL during standard titration; minimum sample volume: 25 mL
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NIR spectrofluorometer which uses a ‘red’ sensitive PMT to obtain data from the UV to the NIR regions; the excitation wavelength range of 200 to 850 and up to 1010 nm for fluorescence emission allows measurements of materials which have fluorescence in the NIR region
  • high sensitivity S/N > 2,500 (RMS)
  • high-speed scanning up to 120,000 nm/min emission
  • resolution: 1 nm for both excitation and emission
  • accessory: integrating sphere (ILF-835)

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Fast response heater, up to 1000°C/minute ramp rates; operation modes: thermal CVD and plasma enhanced CVD; automatic process control; remote operation via TCP/IP (Transport Control Protocol/Internet Protocol); low temperature deposition
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Provides an efficient state-of-theart approach towards microwave synthesis, turning previously unachievable reliability and performance into three-dimensional fact; convenient operation limits up to 300 °C and 30 bar (435 psi) open up unforeseen opportunities for method development and optimization; due to its high field density, the instrument provides rapid heating – even in 30 mL vials and for low absorbing solvents; a reliable, ruby-based fiber optic sensor ensures immediate feedback, approaching the peak of precision in temperature measurement
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Chamber volume 18 - 36 liters; Gas supply - Mass-Flow-Controller (MFCs); vacuum pump Lyebold with active carbon filter; integrated PC-Control

spectral range: 190 - 2700 nm; Peltier temperature control system with temperature range: -10 - 110°C.

Excitation wavelength range: 220 - 750 nm; emission wavelength range: 220 - 750 nm; diffraction grating with 1500 lines/mm
  • epifluorescence attachment (EFA-383)
  • high sensitivity cell holder ( FHM-440)
  • solid sample attachement (FDA 430)
  • liquid phosphorescence measuring cell (LPH-120)
  • solid phosphorescence measuring cell (SPH- 130)
  • fluorescence polarization measurement unit (APH- 103)

- High sensitivity 200 TEC BW16 SILVER-Nova spectrometer with 200um slit installed; SL1-LED excitation source (LED-Kit with  6 LEDs for390nm, 470nm, 502nm, 590nm, 660nm, and white; LED-UV-KIT with 3 UV LED’s: 295nm, 345nm, and 365nm); CUV-F fluorescence cuvette holder that includes a F600-Y-VISNIR fiber optic cable; SpectraWiz Spectroscopy Software

Laser diode at 785 nm; detection range: 200 - 2000 cm-1

Laser diode at 532 nm; detection range: 150-4000 cm-1; Integration Time: 8 ms – 3600s; Optical resolution 14 cm-1 FWHM

Equipped with a laser probe SL1 with an 808 nm diode

Equipped with an O38 standard lens and Optris PI Connect software

Objectives: 5x/10x/20x/40 x/ 80x LWD 

Shelf (plate) heating; cold trap (ice condenser) defrosting function– cold trap temp: (°C) -55/-80; vacuum degree (Pa): <10; drying area: 0,12 m2; drying time: 24 h; defrosting time: 20 min

The outstanding feature of this model is the presence of an Infra-Red dryer in it; inside the unit there is an infrared heater, which offers a maximum temperature of 200°C from ambient; after each dip, the Infrared heater helps in drying the substrate; it provides uniform heating to the substrate; the temperature is swiftly attained so that the time taken for the dipping process is greatly reduced; the coating thickness can be easily controlled by adjusting the withdrawal rate and the viscosity of the coating solution
  • dip coating unit with infrared dryer has both manual as well as PC mode.
  • stole length max: 150 mm; drawing speed min: 18 micron/sec; drawing speed max: 9000 micron/sec; program memory: 8 programs; max temperature 200 °C; max substrate size 75 mm x 25 mm.

Built in our lab - specifically designed to allow the controlled assembly of metallic/polymeric nano- and micro-particle colloids into films on solid substrates; control of substrate temperature (10-35°C); translation /deposition speeds down to 1µm/s; allows preparation of large area (cm2) films from colloids or even polymer films